Epiel expands production by putting new facility into operation and test-launching 200 mm Epi wafer manufacturing
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20.11.2012
The new facility is the core of company’s comprehensive modernization project. The project aims to increase overall Epi wafer production capacity and introduce 200 mm Epi products for Power device and Integrated circuit applications to fulfill the needs of the leading Russian semiconductor manufacturers.
The project features installation of new high-class equipment units at every technological step including wafer preparation, epitaxial deposition and parameter control.
At this stage new production areas with controlled clean room environment (class 10, 100 and 1000) have been created. Clean rooms are equipped with a set of tools including automated wafer cleaning line, wafer parameter control tools and a CVD epitaxial reactor for 150 and 200 mm wafer processing.
The facility has been designed for future production growth with plenty of space for additional equipment units. On the next stage Epiel plans to increase capacity by installing more epitaxial tools. This will also allow to expand the range of Epi products offered by Epiel.
